<p>This invention relates to a process for cleaning reactors. The process utilizes a solvent fed from multiple pressure sources to clean reactors of residual polymers. The reactors are equipped with agitators and stationary nozzles aimed at the agitator blades. The agitator is rotated during cleaning. The process may also utilize heated aqueous base to clean heat exchangers in external loops. In one aspect, a mixture of at least one organic solvent and aqueous base are utilized to clean certain reactors.</p>
申请公布号
EP1471077(A2)
申请公布日期
2004.10.27
申请号
EP20040254140
申请日期
2000.08.14
申请人
ROHM AND HAAS COMPANY
发明人
BRUCE, SPENCER;CARPENTER, JAMES KENT;HURRY, JEANINE LEE;POVERNICK, JOSEPH RICHARD;ROBERTSON, III, FRANK RANDOLPH;SCHWARTZ, ROBERT HUGH;WU, RICHARD SHU-HUA