发明名称 |
Preparation of thin silica films with controlled thickness and tunable refractive index |
摘要 |
A method of forming a porous silica film includes the following steps: a) providing a substrate; b) coating, on a surface of the substrate, a layer of charged polyelectrolyte; and c) applying an aged silica-bearing non-colloidal solution to the coated surface of the substrate to adsorb porous silica thereon. The adsorption cycle of steps (b) and (c) is repeated a number of times to control film thickness. The age and concentration of the silica-bearing solution are selected to control the porosity and the index of refraction of the porous silica film.
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申请公布号 |
US6808742(B2) |
申请公布日期 |
2004.10.26 |
申请号 |
US20030384188 |
申请日期 |
2003.03.07 |
申请人 |
COMPETITIVE TECHNOLOGIES, INC. |
发明人 |
ROUSE JASON H.;FERGUSON GREGORY S. |
分类号 |
C03C17/00;C03C17/25;G02B1/10;(IPC1-7):B05D5/06 |
主分类号 |
C03C17/00 |
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