发明名称 |
Substrate attracting and holding system for use in exposure apparatus |
摘要 |
A substrate attracting and holding method includes steps of supporting a substrate by use of a protrusion provided on a holding table for holding the substrate and reducing pressure between the holding table and the substrate to attract and hold the substrate. The protrusion is disposed to be placed in a predetermined positional relation, with respect to a direction along the surface of the substrate, with (i) a position of an alignment mark to be used for processing the substrate or (ii) a position with respect to which an alignment mark is to be produced. The method also includes attracting and holding the substrate.
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申请公布号 |
US6809802(B1) |
申请公布日期 |
2004.10.26 |
申请号 |
US20000640724 |
申请日期 |
2000.08.18 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
TSUKAMOTO IZUMI;FUJITA ITARU;NOGAWA HIDEKI;TAKABAYASHI YUKIO |
分类号 |
G03F7/20;G03F9/00;(IPC1-7):G03B27/58;G03B27/42;G03B27/32;G01B11/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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