发明名称 |
Pattern writing apparatus, pattern writing method and substrate |
摘要 |
In a pattern writing apparatus for writing a plurality of pattern blocks of LSI chips which are arrayed on a substrate, provided are a rasterization part (312) for rasterizing LSI data 931, an expansion/contraction rate calculation part 313 for obtaining the expansion/contraction rate of a substrate (9) on the basis of an image from a camera (15a), a data correction part (314) for correcting raster data (932) in accordance with the expansion/contraction rate and a data generation part (315) for generating writing data on the basis of the corrected data. From the writing data generated by the data generation part (315), an array of pattern blocks in which the width of a non-pattern region between adjacent ones of the pattern blocks is changed while the width of each pattern block is maintained is written on the substrate. |
申请公布号 |
US6809755(B2) |
申请公布日期 |
2004.10.26 |
申请号 |
US20030424768 |
申请日期 |
2003.04.29 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
NAKAI KAZUHIRO |
分类号 |
G03F7/20;H01L21/027;(IPC1-7):H01L21/027;G03F9/00;G03F7/22;B41J2/47 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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