发明名称 Reduced-pressure drying unit and coating film forming method
摘要 The invention includes a hermetic container provided with a substrate mount; a vacuum exhauster connected to the hermetic container; a current member; and a current member raising and lowering mechanism. When the current member is raised and lowered as a function of the pressure inside the hermetic container, a liquid flow of the coating solution on the substrate is controlled, thereby controlling the uniformity of the film thickness of the coating solution.
申请公布号 US6808566(B2) 申请公布日期 2004.10.26
申请号 US20020217458 申请日期 2002.08.14
申请人 TOKYO ELECTRON LIMITED 发明人 KITANO TAKAHIRO;HAMA MANABU;SUGIMOTO SHINICHI;HIRAKAWA NAOYA
分类号 H01L21/027;B05D3/04;H01L21/00;(IPC1-7):B05C11/00 主分类号 H01L21/027
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