发明名称 |
Reduced-pressure drying unit and coating film forming method |
摘要 |
The invention includes a hermetic container provided with a substrate mount; a vacuum exhauster connected to the hermetic container; a current member; and a current member raising and lowering mechanism. When the current member is raised and lowered as a function of the pressure inside the hermetic container, a liquid flow of the coating solution on the substrate is controlled, thereby controlling the uniformity of the film thickness of the coating solution.
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申请公布号 |
US6808566(B2) |
申请公布日期 |
2004.10.26 |
申请号 |
US20020217458 |
申请日期 |
2002.08.14 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KITANO TAKAHIRO;HAMA MANABU;SUGIMOTO SHINICHI;HIRAKAWA NAOYA |
分类号 |
H01L21/027;B05D3/04;H01L21/00;(IPC1-7):B05C11/00 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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