| 摘要 |
In accordance with the invention, an electron beam source for exposing selected portions of a surface to electrons comprises a plurality of nanoscale electron emitters and, associated with each electron emitter, a directional control element to direct the emitter toward a selected portion of the surface. In a preferred embodiment, the emitters are nanotubes or nanowires mounted on electrostatically controlled MEMS directional control elements. An alternative embodiment uses electrode directional control elements.
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