WAFER COATING APPARATUS TO STABLY SUPPORT AND FIX WAFER

摘要

PURPOSE: A wafer coating apparatus is provided to solve a problem caused by the transfer of an outer cup and to stably support and fix a wafer by fixing the outer cup and by making an upper cup and an inner cup move up/down in the outer cup. CONSTITUTION: An exhaust hole(180) is formed in the lower portion of the outer cup(200). The upper cup(150) and the inner cup are formed in the outer cup. A chuck(100) that vacuum-absorbs and rotates the wafer(W) to be processed is located in the center of the inner cup and the upper cup. The outer cup is fixed. An inner cup cylinder(130,140) elevates the inner cup from the lower portion of the wafer, installed in the lower portion of the inner cup. An outer cup cylinder synchronizes with the inner cup cylinder and elevates the upper cup to expose or non-expose the chuck to the upside.