| 摘要 |
PURPOSE: A method of manufacturing IPS-LCD(In-Plane Switching mode-Liquid Crystal Display) by using 4-mask process is provided to perform a four-count mask process without the manufacturing cost of the ITO transparent layer. CONSTITUTION: A substrate(20) is provided that includes a common/pixel area, a transistor area and an anti-ESD(Electro Static Discharge) circuit area. A first metal layer is formed on the substrate(20) and then is patterned by using a first mask. First metal lines(211) are formed on the common/pixel area, second metal lines(212) are formed on the transistor area, and third metal lines(213) are formed on the anti-ESD circuit area. Sequentially, an insulator layer(22), a silicon based layer(23) and a semiconductive layer(24) are formed on the substrate(20) and the metal lines(211,212,213) sequentially. The silicon based layer(23) generally includes an amorphous silicon, and semiconductive layer(24) generally includes n+ amorphous silicon.
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