发明名称 PHOTOSENSITIVE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE MATERIAL
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive composition having excellent scratch resistance and wear resistance and high sensitivity, and in particular, to provide a photosensitive composition having sufficiently high photosensitivity to a near IR laser light source at &ge;750 nm wavelength and a photosensitive lithographic printing plate using this composition and having excellent printing durability. <P>SOLUTION: The photosensitive composition contains a binder resin, a compound having two or more styrene double bonds in the molecule, and a polyfunctional acrylate compound. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004294935(A) 申请公布日期 2004.10.21
申请号 JP20030089516 申请日期 2003.03.28
申请人 MITSUBISHI PAPER MILLS LTD 发明人 FURUKAWA AKIRA
分类号 G03F7/038;C08F290/12;G03F7/00;G03F7/029 主分类号 G03F7/038
代理机构 代理人
主权项
地址