| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processor for effectively suppressing the contamination of the back face of a substrate in spin cleaning/drying and a substrate processing method using it and a method for manufacturing a photo-mask. SOLUTION: This substrate processor having a mechanism for cleaning and drying a substrate while rotating a substrate horizontally held in a treatment chamber is provided with a substrate holding member having a regulating member for regulating the position of the side face of the substrate, a supporting member for supporting the lower face of the substrate in the outer periphery and a plate-shaped chuck for fixing the regulating member and the supporting member. As for the substrate holding member, the plate-shaped chuck is provided with a flat surface so that the projecting parts of the face opposite to the substrate can be applied to only the regulating member and the supporting member. It is possible to provide a substrate processing method for cleaning and drying the substrate by using this substrate processor and a process for carrying out substrate processing by using the substrate processing method. COPYRIGHT: (C)2005,JPO&NCIPI
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