SILICON DIOXIDE THIN FILM, AND ITS PRODUCTION METHOD

摘要

PROBLEM TO BE SOLVED: To provide an amorphous silicon dioxide thin film having a low refractive index and physical strength such as high flaw resistance. SOLUTION: The amorphous silicon dioxide thin film is transparent, and comprises many fine voids in the inside. Its refractive index (refractive index of light satisfyingλ=500 nm) lies in the range of 1.01 to 1.40, and the diameter of the fine voids accounting for≥80 vol.% of the whole fine void is≤5 nm. COPYRIGHT: (C)2005,JPO&NCIPI