| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To prevent the accuracy of measurement and the reliability of a sensor device from lowering even if its uppermost layer film is damaged by collision of dust. <P>SOLUTION: On a silicon substrate 18, a lower nitride film 20, a lower oxide film 21, a heater 16, a temperature sensitive part 17, an upper oxide film 22, an upper nitride film 23, and the oxide film 25 of an uppermost layer are formed; and a hollow part 19 is formed in the membrane 15 forming part of the silicon substrate 18. Even if the oxide film 25 of the uppermost layer is damaged by the collision of the dust with the membrane 15 when measurement is performed, extension of the damage to the upper nitride film 23 can be prevented, since the hardness of the upper nitride film 23 is higher than that of the oxide film 25 of the uppermost layer. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
