ION BEAM SPUTTERING SYSTEM

摘要

PROBLEM TO BE SOLVED: To improve a deposition speed without increasing the current density of an ion beam. SOLUTION: The ion beam sputtering system performs deposition on a substrate 14 by the particles jumped out of a target 21 by irradiating the target 21 with the ion beam 17, in which the shape of the sputtered surface 21a of the target 21 is formed as a recessed surface shape. A distribution range 22 of the scattered particles converge more than the conventional target formed as a flat surface on its surface and therefore the scattered particles can be effectively stuck onto the substrate 14. COPYRIGHT: (C)2005,JPO&NCIPI