发明名称 HIGH FREQUENCY PLASMA JET SOURCE AND METHOD FOR IRRADIATING A SURFACE
摘要 The invention relates to a high frequency plasma jet source (1) comprising a space (3) for accommodating a plasma, electrical means (8, 9) for applying a voltage to said high frequency plasma jet source (1) so as to ignite and obtain the plasma, means (4) for extracting a plasma jet (I) from the plasma space (3), and an outlet port which is separated from the vacuum chamber (7) by means of an extraction grid (4). The plasma jet (I) emerges from the high frequency plasma jet source (1) with essentially divergent radiation characteristics. The invention further relates to a method for irradiating a surface with a plasma jet (I) of a high frequency plasma jet source, said plasma jet (I) being divergent.
申请公布号 WO2004091264(A2) 申请公布日期 2004.10.21
申请号 WO2004EP03796 申请日期 2004.04.08
申请人 LEYBOLD OPTICS GMBH;BECKMANN, RUDOLF 发明人 BECKMANN, RUDOLF
分类号 H01J37/32;H05H1/54 主分类号 H01J37/32
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