ELECTRON BEAM DRAWING METHOD, METHOD FOR MANUFACTURING MASTER PATTERN, MASTER PATTERN, METHOD FOR MANUFACTURING MOLD, MOLD, OPTICAL DEVICE AND ELECTRON BEAM DRAWING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an electron beam drawing method by which an image is drawn in a shorter time and the drawing feature can be uniformly maintained without being influenced by the scanning position of the electron beam in the drawing region. SOLUTION: Frequency signals having controlled amplitudes according to the scanning position (position of a superposition quantity division field) of the electron beam in a specified drawing region (drawing field) are superposed on the input signal to a deflector which deflects the electron beam so as to oscillate an electron beam B in a sub scanning direction (Y direction in the figure) in the drawn plane (surface of a resist layer L) of a substrate 2. Thereby, the electron beam B is made to scan in the main scanning direction (X direction in the figure) while meandering, and the degree of meandering is controlled to a value according to the position of the superposition quantity division field in the field. COPYRIGHT: (C)2005,JPO&NCIPI