| 摘要 |
PROBLEM TO BE SOLVED: To provide a water treatment apparatus capable of removing sol form fine particles and nitrogen components contained in CMP (Chemical-Mechanical Polishing) waste water, and to provide a water treatment method using the water treatment apparatus. SOLUTION: The sol form fine particle component in the CMP waste water is removed by means of filtration using a filter device 13 having a gelatinous second filter. Further, the nitrogen component in the CMP waste water is removed by means of an electrochemical treatment using an electrode 12. The filtration and the electrochemical treatment can be performed by using individual tanks or in the same tank as well. By performing the filtration and the electrochemical treatment in the same tank, the water treatment apparatus where space is saved can be obtained. COPYRIGHT: (C)2005,JPO&NCIPI
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