发明名称 |
Chemical mechanical polishing apparatus with rotating belt |
摘要 |
A chemical mechanical polishing apparatus has a rotatable platen, a polishing sheet that is wider than the substrate extending between two reels, a drive mechanism to advance the polishing sheet, and a chucking mechanism to intermittently secure the polishing sheet to the platen. The platen can have a platen base that is adaptable to receive either a circular platen top or a rectangular platen top.
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申请公布号 |
US2004209559(A1) |
申请公布日期 |
2004.10.21 |
申请号 |
US20040838689 |
申请日期 |
2004.05.03 |
申请人 |
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发明人 |
BIRANG MANOOCHER;ROSENBERG LAWRENCE M;ROSENBERG SANDRA L;SOMEKH SASSON;WHITE JOHN M |
分类号 |
B24B21/04;B24B27/00;B24B37/04;B24D7/12;H01L21/306;(IPC1-7):B24B1/00 |
主分类号 |
B24B21/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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