发明名称 |
Method of characterizing implantation of species in a substrate |
摘要 |
A method for characterizing a dose or dosage of implanted atomic species in a substrate by annealing the substrate after implantation of the atomic species, with the anneal conducted at a temperature and for a time sufficient to cause the implanted atomic species to from blisters in a surface region of the substrate but below that which would cause a majority or significant amount of the blisters to burst; imaging the surface region of the substrate to obtain a surface image; and processing the surface image to characterize the implant dose of the atomic species. This characterization can be performed on a qualitative or quantitative basis, as desired.
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申请公布号 |
US2004209449(A1) |
申请公布日期 |
2004.10.21 |
申请号 |
US20040809918 |
申请日期 |
2004.03.26 |
申请人 |
MALEVILLE CHRISTOPHE;SCHWARZENBACH WALTER |
发明人 |
MALEVILLE CHRISTOPHE;SCHWARZENBACH WALTER |
分类号 |
G01N25/72;H01L21/265;H01L21/324;H01L21/66;(IPC1-7):H01L21/425 |
主分类号 |
G01N25/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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