发明名称 HOLDER, OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
摘要 <p>An optical member can be held at an adequate position considering the glide of a crystal material of cubic system such as fluorite, and deformation of the optical member due to glide is suppressed. Holders (Ha, Hb) hold transparent optical members in such a way that the crystal orientation &lt;111&gt; of the transparent optical members made of a crystal material of cubic system is generally aligned with the optical axis of the transparent optical members. The transparent optical members are held at regions (for example, the regions corresponding to the crystal orientation &lt;211&gt;) substantially far from the crystal orientation &lt;110&gt;. Alternatively, the transparent optical members are held at regions (for example, the region generally at the midpoint between the crystal orientation &lt;110&gt; and the crystal orientation &lt;211&gt; adjacent to the crystal orientation &lt;110&gt;) substantially far from the crystal orientation &lt;110&gt; and the crystal orientation &lt;211&gt;.</p>
申请公布号 WO2004090954(A1) 申请公布日期 2004.10.21
申请号 WO2004JP04805 申请日期 2004.04.01
申请人 NIKON CORPORATION;NISHIKAWA, JIN;MURAMATSU, KENICHI 发明人 NISHIKAWA, JIN;MURAMATSU, KENICHI
分类号 G02B7/02;G03F7/20;(IPC1-7):H01L21/027 主分类号 G02B7/02
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