发明名称 |
METHOD OF MANUFACTURING MICROSTRUCTURE, DEVICE, OPTICAL ELEMENT, INTEGRATED CIRCUIT, AND ELECTRONIC EQUIPMENT |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a microstructure in which the manufacturing time is shortened and the manufacturing cost is reduced when forming a desired pattern by using liquid materials, and to provide an optical element, an integrated circuit, and electronic equipment . <P>SOLUTION: When liquid materials are used to form a pattern of a desired shape on the surface of a substrate 100, a substrate or the substrate provided with a lyophilic film 12 is subjected to liquid-repelling treatment to provide a liquid repellent film 11. Thereafter, a plurality of insular liquid-repellent parts or a plurality of insular lyophilic parts are formed in a desired pattern region. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
申请公布号 |
JP2004294878(A) |
申请公布日期 |
2004.10.21 |
申请号 |
JP20030088560 |
申请日期 |
2003.03.27 |
申请人 |
SEIKO EPSON CORP |
发明人 |
SAITO YUJI;TAKAGI KENICHI;TANAKA TAKAO |
分类号 |
G02B5/20;H01L21/28;H01L21/288;H01L51/50;H05B33/10;H05B33/14;(IPC1-7):G02B5/20 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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