发明名称 METHOD OF MANUFACTURING POTASSIUM NIOBATE SINGLE CRYSTAL THIN FILM, SURFACE ACOUSTIC WAVE ELEMENT, FREQUENCY FILTER, FREQUENCY OSCILLATOR, ELECTRONIC CIRCUIT AND ELECTRONIC APPLIANCE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a KNbO<SB>3</SB>single crystal thin film by which a rhombic KNbO<SB>3</SB>single crystal thin film is epitaxially grown at a high deposition rate at a temperature near room temperature on various kinds of single crystal substrates, a surface acoustic wave element which has high k<SP>2</SP>and is frequency-band-widened , is small-sized and is excellently power-saved by providing the thin film obtained by the method, a frequency filter, a frequency oscillator, an electronic circuit and an electronic appliance. <P>SOLUTION: The method of manufacturing the KNbO<SB>3</SB>single crystal thin film comprises a coating process for coating an SrTiO<SB>3</SB>single crystal substrate 11 with liquid drops of an aqueous solution containing KNbO<SB>3</SB>by a liquid drop discharge method and a deposition process for depositing the potassium niobate single crystal layer 12 from the applied liquid drops by epitaxial growth. <P>COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004292226(A) 申请公布日期 2004.10.21
申请号 JP20030085761 申请日期 2003.03.26
申请人 SEIKO EPSON CORP 发明人 HIGUCHI AMAMITSU;MORII KATSUYUKI;IWASHITA SETSUYA;MIYAZAWA HIROSHI
分类号 B01D9/02;C30B7/04;C30B19/00;C30B19/12;C30B29/30;H03H3/08;H03H9/02 主分类号 B01D9/02
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