发明名称 |
Method for increasing the accuracy of the positioning of a first object relative to a second object |
摘要 |
A method is provided for increasing the accuracy of the positioning of a first object relative to a second object. The method overcomes the disadvantageous influence of thermal drift between a first and a second object during a positioning of a first object on a second object. The method finds applications in manufacturing, for example, in the manufacturing of semiconductor components. The method utilizes recognition of structures on the second object which have a minimum structure width. At a first instant, using one recognition procedure, the first object is positioned on the second object in a desired position. The relative displacement of the two objects is determined at the first instant and on at least one subsequent instant. A second recognition procedure may be used for this purpose. The second recognition procedure may have a resolution accuracy which is different than the resolution accuracy of the first resolution procedure. The second recognition procedure may be a pattern recognition method. The relative displacement determined at the second instant is used to correct the positioning of the first and second objects as necessary to maintain a desired position of the two objects.
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申请公布号 |
US2004208355(A1) |
申请公布日期 |
2004.10.21 |
申请号 |
US20040824884 |
申请日期 |
2004.04.15 |
申请人 |
SCHNEIDEWIND STEFAN;DIETRICH CLAUS;KIESEWETTER JORG;TEICH MICHAEL;THARIGEN THOMAS |
发明人 |
SCHNEIDEWIND STEFAN;DIETRICH CLAUS;KIESEWETTER JORG;TEICH MICHAEL;THARIGEN THOMAS |
分类号 |
G06T7/00;(IPC1-7):G06K9/00 |
主分类号 |
G06T7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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