发明名称 ELECTROSTATIC CHUCK AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an electrostatic chuck which can attain a vacuum hermeticity of 1.3×10<SP>-10</SP>(Pa m<SP>3</SP>)/s even if a composite material having a porosity of 5-50% is joined to the ceramic electrostatic chuck. SOLUTION: The electrostatic chuck comprises an electrostatic attracting section which has a placement surface 7 for a wafer W which is one principal plane of a plate-like ceramic material 1 and has an electrode 2 on the other surface of or inside the plate-like ceramic material 1, and a plate 4 made of a composite material of SiC, Al, and Si which is joined to the surface opposite from the placement surface of the electrostatic attracting section via a metal bonding layer 3. The metal bonding layer 3 has a thickness of 10-200μm, and a rate of area occupied by Al in a surface of the plate 4 made of the composite material which is in contact with the metal bonding layer is 80% or less. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004296579(A) 申请公布日期 2004.10.21
申请号 JP20030084284 申请日期 2003.03.26
申请人 KYOCERA CORP 发明人 YOKOYAMA KIYOSHI
分类号 C23C14/50;H01L21/68;H01L21/683;H02N13/00;(IPC1-7):H01L21/68 主分类号 C23C14/50
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