发明名称 EXPOSURE SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide an exposure system that can accurately project the image of a spacial light modulation element upon an image forming surface. SOLUTION: A four-division detector 26 is disposed so that four pixels 48<SB>1</SB>, 48<SB>2</SB>, 48<SB>3</SB>, and 48<SB>4</SB>(pixels of an exposed image) existing at one corner of an exposure area may respectively correspond to the four diodes 26<SB>1</SB>, 26<SB>2</SB>, 26<SB>3</SB>, and 26<SB>4</SB>of the detector 26. When a relative positional deviation exists between a DMD 10 and a microlens array 18, differences occur among the output signals P<SB>1</SB>, P<SB>2</SB>, P<SB>3</SB>, and P<SB>4</SB>of the four-division detector 26, and the deviation (positional deviation of a beam) between the light beam reflected by the micro-mirror (pixel section) of the DMD 10 and its corresponding microlens can be detected. The relative positional deviation between the DMD 10 and microlens array 18 is eliminated by adjusting the position of the microlens array 18 based on the detected deviation. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004296531(A) 申请公布日期 2004.10.21
申请号 JP20030083608 申请日期 2003.03.25
申请人 FUJI PHOTO FILM CO LTD 发明人 TAKADA TSUNEHISA
分类号 G03F7/20;G03B27/54;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
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