发明名称 |
ORGANO-SILSESQUIOXANE POLYMERS FOR FORMING LOW-K DIELECTRICS |
摘要 |
<p>A low dielectric constant polymer, comprising monomeric units derived from a compound having the general formula I (R<1>-R<2>)n-Si-(X<1>)4-n, wherein each X<1> is independently selected from hydrogen and inorganic leaving groups, R<2> is an optional group and comprises an alkylene having 1 to 6 carbon atoms or an arylene, R<1> is a polycycloalkyl group and n is an integer 1 to 3. The polymer has excellent electrical and mechanical properties.</p> |
申请公布号 |
WO2004090019(A1) |
申请公布日期 |
2004.10.21 |
申请号 |
WO2004FI00223 |
申请日期 |
2004.04.13 |
申请人 |
SILECS OY;RANTALA, JUHA;PAULASAARI, JYRI;KYLMAE, JANNE |
发明人 |
RANTALA, JUHA |
分类号 |
C08G77/04;C08G77/20;H01B3/30;H01B3/46;(IPC1-7):C08G77/20 |
主分类号 |
C08G77/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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