POSITIVE RESIST COMPOSITION AND ITS MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a positive resist composition excellent in dependence on the concentration of a developing solution and durability against side lobe light (side robe margin).

SOLUTION: The chemical amplifying resist composition contains: (A-1) a resin having a fluorine atom in the main chain of the polymer skeleton; (A-2) a resin containing a repeating unit having a specified structure having a fluorine atom in the side chain of the polymer skeleton; and (B) a compound which generates an acid by irradiation of active rays or radiation.

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