| 摘要 |
PROBLEM TO BE SOLVED: To provide a diffusion plate which hardly generates a speckle pattern, has excellent transmissivity, and is usable in a ultraviolet-ray range. SOLUTION: A substrate 2 coated with a resist 3 is irradiated with light through a mask 1 to expose the resist 3. The mask 1 has patterns formed at random positions. After the exposure, the resist 3 is developed to obtain a solid shape shown in (b). In this state, the substrate 2 and resist 3 are etched together by using an etching system capable of etching the substrate 2 and resist 3 at the same time to transfer the resist pattern in (b) to the substrate 2 as shown in (c), and the substrate 2 has unevenness corresponding to the patterns of the mask 1 and is usable as a diffusion plate. COPYRIGHT: (C)2005,JPO&NCIPI
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