| 发明名称 |
Plasma processing apparatus |
| 摘要 |
On one side of a microwave entrance window that is exposed to the atmosphere, a slot plate having slots and a resonant unit are provided. The slot plate and the resonant unit are integrally placed to be slidable by linear guides with respect to a process chamber. In this way, a plasma processing apparatus can be provided that performs a highly uniform plasma process and is excellent in terms of plasma generation property.
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| 申请公布号 |
US2004206456(A1) |
申请公布日期 |
2004.10.21 |
| 申请号 |
US20040843004 |
申请日期 |
2004.05.10 |
| 申请人 |
TADERA TAKAMITSU;YAMAMOTO TATSUSHI;HIRAYAMA MASAKI;OHMI TADAHIRO |
发明人 |
TADERA TAKAMITSU;YAMAMOTO TATSUSHI;HIRAYAMA MASAKI;OHMI TADAHIRO |
| 分类号 |
H05H1/46;B23K10/00;C23C16/511;H01L21/205;H01L21/302;H01L21/3065;H01L21/31;H05H1/30;(IPC1-7):H01L21/306 |
主分类号 |
H05H1/46 |
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