PHOTOMASK AND EXPOSURE APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an exposure apparatus and a photomask in which displacement or dropping of the photomask is prevented and the throughput is improved in an apparatus employing a proximity exposure method.

SOLUTION: In the photomask 5 to be opposed through a proximity gap P to a CF substrate 2 as the exposure object during exposure, the mask has a groove 8 on the face opposing to the CF substrate 2 so as to supply and discharge gas between the proximity gap P and the outside.

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