发明名称 MASK AND ALIGNMENT METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a mask capable of preventing lowering of alignment precision caused by a reinforced part of the mask while relaxing restriction on the alignment mark position, and to provide an alignment method. <P>SOLUTION: The alignment method comprising a step for irradiating an exposure object arranged on the second surface side of a mask with alignment light through the mask from the first surface side thereof, and a step for aligning the mask and the exposure object by detecting the alignment light reflected from the exposure object on the first surface side is further provided with a step for reflecting the alignment light on the wall face at a reinforced part formed on the first surface of the mask. That mask is employed in the inventive alignment method. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p>
申请公布号 JP2004297002(A) 申请公布日期 2004.10.21
申请号 JP20030090691 申请日期 2003.03.28
申请人 SONY CORP 发明人 NOUDO SHINICHIRO;SASAKI TAKAYUKI;MIZUNO SHINICHI
分类号 G03F1/20;G03F7/20;G03F9/00;H01J37/305;H01L21/027;(IPC1-7):H01L21/027;G03F1/16 主分类号 G03F1/20
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