SPATIAL MODULATION DOPING METHOD, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND MANUFACTURING METHOD OF QUANTUM DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a spatial modulation doping method capable of selectively carrying out spatial doping without the need for forming a mask. SOLUTION: In the case of applying doping to a semiconductor substrate by emitting a neutron beam to the semiconductor substrate including at least one stable isotope as a constituent element to cause nuclear reaction of the stable isotope, employing a diffraction pattern obtained by emitting the neutron beam 15 to a diffraction grating 12 provides spatial contrast to the emission dose of the neutron so as to carry out spatially selectable doping. A quantum dot array or the like is formed by this method. COPYRIGHT: (C)2005,JPO&NCIPI