发明名称 |
SPUTTERING TARGET AND METHOD FOR PREPARATION THEREOF |
摘要 |
<p>A sputtering target having been prepared by the butt joining of metal sheets having the same quality, characterized in that an intermetallic compound in a joined portion has an average particle 60 to 130 % that of the intermettalic compound in a non-jointed portion. In the sputtering target, the particle diameter of an intermetallic compound in a joined portion is similar to that of the intermetallic compound in a non-joined portion.</p> |
申请公布号 |
WO2004090194(A1) |
申请公布日期 |
2004.10.21 |
申请号 |
WO2004JP03864 |
申请日期 |
2004.03.22 |
申请人 |
KOBELCO RESEARCH INSTITUTE, INC.;MATSUMURA, HIROMI;YONEDA, YOICHIRO |
发明人 |
MATSUMURA, HIROMI;YONEDA, YOICHIRO |
分类号 |
B23K20/22;C23C14/34;(IPC1-7):C23C14/34;B23K20/12 |
主分类号 |
B23K20/22 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|