发明名称 |
Detecting environmental or process parameters in process-wafer manufacturing environment for semiconductor integrated circuit manufacture, by exposing wafer comprising sensors to manufacturing environment |
摘要 |
<p>By arranging sensors (31,32,33) on a carrier substrate (2), a sensor wafer (1) is provided which is compatible with the processor wafers for the manufacturing environment. The sensor wafer is exposed to the manufacturing environment in the manner of a process wafer. At least some of the sensors are formed as gas sensors. Independent claims are included for a sensor-wafer, and for a measuring device for detecting environmental and/or process parameters.</p> |
申请公布号 |
DE10314150(A1) |
申请公布日期 |
2004.10.21 |
申请号 |
DE2003114150 |
申请日期 |
2003.03.28 |
申请人 |
INFINEON TECHNOLOGIES AG |
发明人 |
MARX, ECKHARD;HOCKE, CHRISTOPH |
分类号 |
H01L21/66;H01L23/544;(IPC1-7):H01L21/66;H02J17/00 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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