发明名称 Detecting environmental or process parameters in process-wafer manufacturing environment for semiconductor integrated circuit manufacture, by exposing wafer comprising sensors to manufacturing environment
摘要 <p>By arranging sensors (31,32,33) on a carrier substrate (2), a sensor wafer (1) is provided which is compatible with the processor wafers for the manufacturing environment. The sensor wafer is exposed to the manufacturing environment in the manner of a process wafer. At least some of the sensors are formed as gas sensors. Independent claims are included for a sensor-wafer, and for a measuring device for detecting environmental and/or process parameters.</p>
申请公布号 DE10314150(A1) 申请公布日期 2004.10.21
申请号 DE2003114150 申请日期 2003.03.28
申请人 INFINEON TECHNOLOGIES AG 发明人 MARX, ECKHARD;HOCKE, CHRISTOPH
分类号 H01L21/66;H01L23/544;(IPC1-7):H01L21/66;H02J17/00 主分类号 H01L21/66
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