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发明名称
晶体薄膜的制造方法
摘要
本发明揭示一种藉着熔化及再凝固一薄膜制造晶体薄膜之方法,其特征为制备一薄膜,该薄膜具有一特定区域,并藉着以下任一步骤所获得:即(A)形成一薄膜之步骤,其中同时存在有一“特定区域”及一“持续至该特定区域之周边及与该特定区域有不同厚度之区域”,或(B)以电磁波或具有一质量之微粒于一特定区域及其周边区域之间用彼此不同之条件照射一薄膜,及熔化与再凝固该薄膜之至少一部份之步骤。因可正确及轻易地控制该特定区域之空间位置,其可能获得一晶体薄膜,其中一晶粒系形成在一想要位置中。
申请公布号
TW200421450
申请公布日期
2004.10.16
申请号
TW092133410
申请日期
2003.11.27
申请人
佳能股份有限公司
发明人
云见日出也;山崎刚生;渡边壮俊
分类号
H01L21/20
主分类号
H01L21/20
代理机构
代理人
林志刚
主权项
地址
日本
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