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发明名称
在基板表面上形成金属氧化物之成膜方法
摘要
于真空容器内导入含金属元素有机原料气体及氧自由基,使此等反应,于配置在上述真空容器内之基板表面形成金属氧化膜为其特征之成膜方法。
申请公布号
TW200421457
申请公布日期
2004.10.16
申请号
TW093106069
申请日期
2004.03.08
申请人
安内华股份有限公司
发明人
熊谷晃;张宏
分类号
H01L21/20;H01L27/00
主分类号
H01L21/20
代理机构
代理人
林志刚
主权项
地址
日本
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