SYSTEM AND METHOD FOR VACUUM DEPOSITION CAPABLE OF SEPARATING TRANSFER CHANNEL OF SHADOW MASK FROM SUBSTRATE

摘要

PURPOSE: A system and a method for vacuum deposition are provided to exchange rapidly a shadow mask and reduce a processing period by separating a transfer channel of the shadow mask from a substrate. CONSTITUTION: A shadow mask alignment/attachment/detachment chamber(20) includes a shadow mask alignment/attachment/detachment unit for aligning and attaching a shadow mask on a substrate or detaching the shadow mask from the substrate and a substrate transfer unit for transferring the substrate. A process chamber(10a) is used for performing a deposition process for the substrate on which the shadow mask is adhered. A mask storage chamber(40) is installed at one side of the shadow mask alignment/attachment/detachment chamber in order to extract the shadow mask separated from the substrate.