ETCHANT COMPOSITION ETCHING DOUBLE LAYER AND SINGLE LAYER OF METAL THIN FILM TOGETHER

摘要

PURPOSE: An etchant composition is provided, which can etches together a molybdenum/aluminum-neodymium(Mo/Al-Nd) double layer and a molybdenum(Mo) single layer for gate and source/drain electrodes of a circuit of a TFT LCD. CONSTITUTION: The etchant composition comprises: 50-60wt% of phosphoric acid; 0.5-2.5wt% of nitric acid; 15-25wt% of acetic acid; 0.1-1wt% of at least one alcohol and/or substituted ammonium hydroxide selected from the group of consisting of C1-C3 alkanol and ammonium hydroxide substituting at least one hydrogen by C1-C4 alkyls, wherein the substituted ammonium hydroxide is tetramethyl ammonium hydroxide; and the balance of water.