POSITIVE TYPE PHOTORESIST COMPOSITION FOR DISCHARGE NOZZLE TYPE COATING METHOD TO IMPROVE ITS ECONOMY AND METHOD OF FORMING RESIST PATTERN

摘要

PURPOSE: A positive type photoresist composition useful for a discharge nozzle type coating method, is provided to improve its economy by reducing the amount of the composition discharged from the nozzle and thus prevent stripe marks on the substrate. CONSTITUTION: The positive type photoresist composition useful for a discharge nozzle type coating method comprise: (A) an alkali-soluble novolac resin having a weight average molecular weight of 6000 or more, when being calculated as polystyrene, (C) a compound containing a naphthoquinone diazide group; and (D) an organic solvent, and optionally further comprises (B) a compound containing a phenolic hydroxyl group having a molecular weight of 1000 or less, wherein the discharge nozzle type coating method comprises a step of applying a positive type photoresist composition over the whole surface of a substrate by relatively moving the discharge nozzle and the substrate.