METHOD FOR OPTIMIZING SOURCE AND MASK TO RAPIDLY CALCULATE MASK PARAMETER

摘要

PURPOSE: A method for optimizing a source is provided to shorten an interval of time for calculating a mask parameter by limiting the number of optimizing parameters of a considered mask. CONSTITUTION: An illumination source supplies light to a plurality of source points and a predetermined mask pattern. A fragmentation point is selected from an image plane of an image formed by the light supplied to the predetermined mask pattern(S1). Image log slope and intensity of light is determined from each fragmentation point. An optimum illumination source maximizes the image log slope in the selected fragmentation point and is determined to be an illumination source having an intensity in a predetermined range.