| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which is capable of improving processing uniformity at an upstream of a boat, preventing any defective substrate from occurring in an after process, and improving both the yield and substrate processing quality as a whole. SOLUTION: The substrate is equipped with a reaction oven processing a substrate 21, a substrate holding jig 11 which supports the substrates 21 in the reaction oven, a gas inlet tube 9 feeding gas into the reaction oven, and a plurality of plates 25 and 26 provided at the upper side of the substrate holding jig 11. The plates are, at least, composed of two types of plates that are different from each other in area. COPYRIGHT: (C)2005,JPO&NCIPI |
