| 摘要 |
PROBLEM TO BE SOLVED: To prevent sulfur residue and particles from remaining on the surface of a substrate after treatment with a mixture of sulfuric acid and hydrogen peroxide solution. SOLUTION: In a method of treating substrate, after a resist film was peeled from the surface of the substrate by using the mixture of sulfuric acid and hydrogen peroxide solution, a soft spraying of SC1 (NH<SB>4</SB>OH+H<SB>2</SB>O<SB>2</SB>+H<SB>2</SB>O) is performed, and supplying a jet of droplets of SC1 is performed to the surface of the substrate. Alternatively, after a resist film was peeled from the surface of the substrate by using the mixture of sulfuric acid and hydrogen peroxide solution, ultrasonic vibration is given to the SC1, and the SC1 that has been given ultrasonic vibration is supplied to the surface of the substrate. COPYRIGHT: (C)2005,JPO&NCIPI
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