METHOD FOR ANALYZING THIN FILM THREE-LAYER STRUCTURE USING SPECTROSCOPIC ELLIPSOMETER

摘要

PROBLEM TO BE SOLVED: To provide a method for measuring and analyzing a thin film three-layer structure by using a spectroscopic ellipsometer. SOLUTION: This method for measuring and analyzing a thin film three-layer structure is a method for analyzing a thin film three-layer structure by using the spectroscopic ellipsometer in case where first and third layers among thin-film three layers on a substrate include an optical constant common to both while a second layer has a different optical constant. This method comprises: a spectrometry phase 10 for obtaining measurement data by using the spectroscopic ellipsometer; a case determination phase 20 for selecting a case based on known information; an analysis phase 1 for determining an initial model for the three-layer structure; an analysis phase 2 for determining an optical constant and a film thickness on each layer on the initial model; and an analysis phase 3 for performing final fitting on the model obtained in the phase 2 and ascertaining its result for storing. COPYRIGHT: (C)2005,JPO&NCIPI