| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material having such high pressure resistance as to ensure little blackening and few sensitization marks due to unintended pressure. SOLUTION: The heat developable photosensitive material containing a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder on the same surface of a support contains at least one selected from the group comprising compounds represented by the formula (1a): R-Y<SB>1</SB>-(L<SB>1</SB>)<SB>n1</SB>-CX<SB>1</SB>X<SB>2</SB>X<SB>3</SB>, the formula (1b): R-Y<SB>2</SB>-L<SB>2</SB>-CX<SB>1</SB>X<SB>2</SB>X<SB>3</SB>, and the formula (1c): R-Y<SB>3</SB>-(L<SB>3</SB>)<SB>n2</SB>-CX<SB>1</SB>X<SB>2</SB>X<SB>3</SB>, and includes at least one selected from (A) a conductive layer containing a conductive metal oxide on at least one surface side with respect to the support, (B) a fluorine compound having a fluoroalkyl group in which the number of C atoms is≥2 and the number of F atoms is≤12, and (C) a matting agent having an average particle diameter of 0.5-6.0μm. COPYRIGHT: (C)2005,JPO&NCIPI
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