METHOD FOR MEASURING DEGREE OF ETCHING

摘要

PROBLEM TO BE SOLVED: To provide a method and a device capable of exactly obtaining an etching degree during and/or after an etching process independently of an etching method of a material. SOLUTION: The method and the device for obtaining the etching degree of the material 25 by arranging detector elements 60 and 72 adjacently to a part of the material 25 to be etched are provided. The element widths W1 and W2 varies. The resistance of the detector element is measured during etching of a part. COPYRIGHT: (C)2005,JPO&NCIPI