| 摘要 |
PROBLEM TO BE SOLVED: To provide a cylindrical substrate cleaning method capable of avoiding a nonuniform picture image such as half-tone, or the like, which is possibly caused due to an aqueous detergent solution remaining on the cylindrical substrate, thereby providing a cylindrical substrate with a high cleaning quality. SOLUTION: This invention relates to the cylindrical substrate cleaning method utilizing at least one aqueous solution for cleaning and is characterized by dipping the cylindrical substrate into the aqueous solution at least once, with at least the last dipping solution substantially containing silica at a concentration of 30 mg/l or less. COPYRIGHT: (C)2005,JPO&NCIPI
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