发明名称 |
Method for enhancing adhesion between reworked photoresist and underlying oxynitride film |
摘要 |
A method for enhancing adhesion between a reworked photoresist and an underlying oxynitride film. A photoresist pattern layer is formed on an oxynitride layer overlying a substrate. The photoresist pattern layer is removed by acidic solution or oxygen-containing plasma. A surface treatment is performed on the oxynitride layer using a development solution to repair the damaged oxynitride layer due to removing the overlying photoresist pattern layer. A reworked photoresist pattern layer is formed on the oxynitride layer.
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申请公布号 |
US2004202964(A1) |
申请公布日期 |
2004.10.14 |
申请号 |
US20030611196 |
申请日期 |
2003.07.01 |
申请人 |
NANYA TECHNOLOGY CORPORATION |
发明人 |
WU WEN-BIN;WU YUAN-HSUN;CHEN YI-NAN;HUANG TENG-YEN |
分类号 |
G03F7/085;G03F7/11;H01L21/027;(IPC1-7):G03F7/26 |
主分类号 |
G03F7/085 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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