| 摘要 |
PROBLEM TO BE SOLVED: To provide a lithograph projector being employed effectively in both DUV and EUV lithographs and having a means for controlling molecular contamination in situ. SOLUTION: The lithograph projector comprises a mechanism for supplying a projection radiation beam, a structure supporting a member for patterning the projection beam according to a desired pattern, and a mechanism for projecting a patterned beam to a target part of a substrate. COPYRIGHT: (C)2005,JPO&NCIPI
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