发明名称 |
Phase difference interferometry system for wave front measurement for optical imaging system uses mask structure on object side and grating structure on image side |
摘要 |
<p>The phase difference interferometry system for optical imaging has an object pupil midway between an object-side positive lens and an imaging-side positive lens. It uses a black-and-white mask structure (6a) on the object side and a checkerboard grating structure (7a) on the image side. Various interference patterns may be obtained.</p> |
申请公布号 |
DE10316123(A1) |
申请公布日期 |
2004.10.14 |
申请号 |
DE2003116123 |
申请日期 |
2003.04.04 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
HAIDNER, HELMUT;EMER, WOLFGANG;HOCH, RAINER;WEGMANN, ULRICH;SCHRIEVER, MARTIN;GOEPPERT, MARKUS |
分类号 |
G01B9/02;G01J9/04;(IPC1-7):G01J9/04 |
主分类号 |
G01B9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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