发明名称 Phase difference interferometry system for wave front measurement for optical imaging system uses mask structure on object side and grating structure on image side
摘要 <p>The phase difference interferometry system for optical imaging has an object pupil midway between an object-side positive lens and an imaging-side positive lens. It uses a black-and-white mask structure (6a) on the object side and a checkerboard grating structure (7a) on the image side. Various interference patterns may be obtained.</p>
申请公布号 DE10316123(A1) 申请公布日期 2004.10.14
申请号 DE2003116123 申请日期 2003.04.04
申请人 CARL ZEISS SMT AG 发明人 HAIDNER, HELMUT;EMER, WOLFGANG;HOCH, RAINER;WEGMANN, ULRICH;SCHRIEVER, MARTIN;GOEPPERT, MARKUS
分类号 G01B9/02;G01J9/04;(IPC1-7):G01J9/04 主分类号 G01B9/02
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