发明名称 |
Lithographic apparatus device manufacturing method and device manufactured thereby |
摘要 |
A lithographic projection apparatus includes an active reflector in a radiation system providing a projection beam of radiation and/or in a projection system. The active reflector includes a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of the reflecting multilayer, wherein the actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer. The actuator may be operative to apply torques to said reflector.
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申请公布号 |
US2004202898(A1) |
申请公布日期 |
2004.10.14 |
申请号 |
US20040834834 |
申请日期 |
2004.04.30 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN DIJSSELDONK ANTONIUS JOHANNES JOSEPHUS;LOOPSTRA ERIK ROELOFF;FRANKEN DOMINICUS JACOBUS PETRUS ADRIANUS |
分类号 |
G02B5/10;G02B7/185;G02B26/08;G03F7/20;G03F7/22;H01L21/027;(IPC1-7):G03F9/00;B32B9/00;B32B19/00 |
主分类号 |
G02B5/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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