发明名称 Lithographic apparatus device manufacturing method and device manufactured thereby
摘要 A lithographic projection apparatus includes an active reflector in a radiation system providing a projection beam of radiation and/or in a projection system. The active reflector includes a body member, a reflective multilayer and at least one actuator controllable to adjust the surface figure of the reflecting multilayer, wherein the actuator exerts a substantial force component in a direction parallel to the surface figure of said reflective multilayer. The actuator may be operative to apply torques to said reflector.
申请公布号 US2004202898(A1) 申请公布日期 2004.10.14
申请号 US20040834834 申请日期 2004.04.30
申请人 ASML NETHERLANDS B.V. 发明人 VAN DIJSSELDONK ANTONIUS JOHANNES JOSEPHUS;LOOPSTRA ERIK ROELOFF;FRANKEN DOMINICUS JACOBUS PETRUS ADRIANUS
分类号 G02B5/10;G02B7/185;G02B26/08;G03F7/20;G03F7/22;H01L21/027;(IPC1-7):G03F9/00;B32B9/00;B32B19/00 主分类号 G02B5/10
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