PHOTOMASK PATTERN INSPECTING METHOD, PHOTOMASK PATTERN INSPECTING DEVICE, AND PHOTOMASK PATTERN INSPECTING PROGRAM

摘要

An image of an inspection object pattern formed on a photomask is captured. The image of the inspection object pattern is converted into inspection object pattern data, which is input data for light intensity distribution simulation for determining a light intensity distribution reflecting the optical conditions of an exposure apparatus used for pattern transfer. Using the inspection object pattern data, a light intensity distribution simulation is carried out. The difference between the light intensity distribution of the inspection object pattern determined by the light intensity distribution simulation and a reference light intensity distribution is determined. By using the difference, a reverse light intensity distribution simulation having a reversibility with the light intensity distribution simulation is carried out to obtain difference pattern data used to detect a defect, if any, of the inspection object pattern. Since a defect of the inspection object pattern can be recognized as an image, detection of a defect of an inspection object pattern can be carried out with high accuracy, and the position of the defect of the inspection object pattern can be easily and reliably determined.